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| Release 8.0.0
| Date | September 10, 2009 |
| Status | General |
Overview
This release adds support for Microsoft Visual Studio 2008 and 64-bit computers. New drawing fitting options fit the drawing to the drawing canvas or the printed page, and the symmetric layout style is significantly faster.
New
System
- Support for 64-bit computers
User Interactions
Printing and Exporting
Layout
- Drawing Fitting optimizes use of the drawing canvas or printed page
Documentation
- Reference page of available resources
- Guides for development setup and deployment setup
Improvements
Layout
- Significantly faster symmetric layout style
Demonstration Application
- Redesigned graphical UI and icons
- Reorganized toolbars and menus
Documentation
- Reorganized Home page
- Enhanced Developer's Guide
Requirements
- Added support for applications that target 64-bit systems
- These operating systems have been added:
- Microsoft Windows 7
- Microsoft Windows Server 2008
- Microsoft Windows Vista
- Microsoft Windows XP Professional SP3
- These operating systems have been dropped:
- Microsoft Windows 2000 Professional SP4
- Microsoft Windows Server 2003
- Microsoft Windows XP Professional SP2
- Added support for Microsoft Visual Studio 2008
- Dropped support for Microsoft Visual Studio 2003
Fixes
Issues
- The installation process for Tom Sawyer Visualization can cause a program compatibility warning message to appear when installing with Microsoft Windows 7 or 2008 server. This warning can be safely ignored.
Release 7.0.0
| Date | April 21, 2006 |
| Status | General |
Overview
This release features improvements to the interactive environment and enhanced implementations of the circular and symmetric layout styles. Hit-testing sensitivity at low zoom levels is improved, enabling users to select and locate specific nodes and edges more easily.
New
User Interactions
Printing and Exporting
Improvements
User Interactions
- Improved link navigation speed
- Enhanced hit-testing sensitivity for improved selection at low zoom levels
Layout
- Circular Layout Style
- Significantly improved clustering
- Clusters placed in concentric circles
- Nodes placed within cluster interiors
- Enhanced incremental layout
- Simplified spacing control
- Symmetric Layout Style
- Improved drawing resolution
- Enhanced incremental layout
- Dramatically increased performance
Requirements
- Added support for Microsoft Visual Studio 2005
- These development environments have been dropped:
- Microsoft Visual C++ 6.0
- Microsoft Visual Studio .NET 2002
Fixes
Issues
- A drag operation terminates hit-testing; a workaround is available.
- Bottom nested view spacing cannot be controlled.
- Bends of hidden edges are not saved.
- Interdrawing edges cannot be hidden.
- Methods for finding child and parent drawings fail to consider meta-edges and interdrawing edges.
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