This release introduces an option to rotate edge labels so that they run parallel to their associated edge segments. Layout is significantly faster, particularly with large data sets.
Further, this release improves product quality and performance, and updates the supported operating systems.
New
Technology
Added JDK 8.0 support
Layout
Added edge bend removal for better orthogonal drawings
Added ability to rotate edge labels
Introduced a new approach that reduces crossings in the orthogonal drawing style
Documentation
Added an option to improve documentation search speed by ignoring the API documentation
Improvements
Layout
Improved the performance of layout, labeling, and routing
Improved inside node connector and labeling placement in all layout styles
Improved node labeling to avoid possible overlaps
Improved node inside label positioning
Improved connector label placement
Improved movable connector positioning
Improved node packing to eliminate node overlaps after incremental layout
Improved disconnected node packing in the circular layout style
Improved hierarchical layout performance for nested drawings by as much as eighty-five percent
Improved nested hierarchical layout to have fewer crossings
Improved disconnected node placement in hierarchical layout
Improved node placement in hierarchical layout for nested drawings
Improved node packing in nested drawings with a hierarchical layout style
Five percent faster performance than prior version
Improved drawing fitting with nested drawings
Improved edge distribution at node sides
Enhanced packing of connected components and disconnected nodes
Exposed fixed drawing option
Exposed embedded node option
Exposed embedded edge option
Hierarchical
Improved orthogonal edge routing to align horizontal and
vertical edge segments
Orthogonal
Refined integrated labeling
Improved incremental layout results
Symmetric
Improved node placement in the presence of moveable connectors
Labeling
Reduced label overlap in dense drawings
Reduced label position ambiguity
Routing
Improved interdrawing edge routing to connectors
Respects arrowhead width
Documentation
Dynamic content loading
Improved API documentation
System Requirements
Added support for these operating systems:
Apple OS X 10.8
Apple OS X 10.9
Oracle Linux 5
Oracle Linux 6
Microsoft Windows 8
Microsoft Windows 8.1
Microsoft Windows Server 2012
Dropped support for these operating systems:
Apple OS X 10.6
Apple OS X 10.7
Microsoft Windows Vista
Fixes
Drawings
Meta-edges may attach to connectors
Layout
Orthogonal layout respects connected component and disconnected node spacing options
Fixed node label overlaps
Fixed interdrawing edge label overlaps
Issues
None
Release 9.3.1
Date
March 14, 2013
Status
General
Overview
This release updates the supported operating systems to allow easier installation on Microsoft Windows 8.
New
None
Improvements
None
System Requirements
Added support for Microsoft Windows 8
Added support for JDK 7.0 on Apple Mac OS X
Fixes
None
Issues
None
Release 9.3.0
Date
March 30, 2012
Status
General
Overview
Tom Sawyer Layout offers markedly improved performance for large drawings with thousands of nodes. This release introduces a new approach to integrated orthogonal routing within nested drawings. Polyline routing in hierachical layout has been improved. Additionally, labeling is more precise.
New
Technology
Added JDK 7.0 support
Improvements
Installers
Refined installers
Improved installation directories
Layout
Circular layout
Enhanced rotation of disconnected components
Multi-edge spacing option
Hierarchical layout
Faster performance with constraints and nesting
Enhanced integrated labeling with orthogonal routing
Integrated orthogonal routing across nesting levels
Polyline routing refinements
Orthogonal layout
Twenty percent performance improvement
Enhanced integrated labeling
Integrated orthogonal routing across nesting levels
Directed multi-edge bundling refinements
Symmetric layout
Thirty-five percent performance improvement
Enhanced rotation of disconnected components
Multi-edge spacing option
Labeling
Improved labeling precision
Respects edge thickness
Respects arrowheads
System Requirements
Added support for these operating systems:
Apple Mac OS X Lion 10.7
Red Hat Enterprise Linux 6
Dropped support for Red Hat Enterprise Linux 5
Added support for JDK 7.0
Dropped support for JDK 5.0
Fixes
Multi-edge spacing respected
Issues
None
Release 9.2.0
Date
April 13, 2011
Status
General
Overview
This release provides all of the documentation in HTML format, with global search capability. Additionally, this release addresses the needs of several of our large network management customers.
New
Technology
Added batch processing APIs for improved drawing creation performance
Layout
All layout
Enabled treating certain child drawings as fixed during nested drawing layout
Documentation
Added search capability across all documentation
Improvements
Visualization
Added option to preserve owner node position during nested drawing changes
Layout
All layout
Enhanced node and edge embedding during incremental layout
Enhanced moveable connector placement when multiple edges are attached
Circular layout
Improved cluster spacing
Improved node spacing within clusters
Refined drawing fitting
Symmetric layout
Refined drawing fitting
Documentation
Converted all documentation to HTML format
System Requirements
Dropped support for Apple Mac OS X 10.5
Fixes
Drawing manager meta-edge APIs return consistent results when meta-edges are not viewable
Drawing fitting is respected when arranging connected components in the orthogonal layout style
Layout calculates optimal expanded node size when fixed connector labels are present
Issues
None
Release 9.1.1
Date
October 8, 2010
Status
General
Overview
This release includes layout refinements and improved access to hosted licensing.
New
None
Improvements
Licensing
Simplified access to hosted licensing through a web proxy
Layout
Circular layout
Improved Drawing Fitting
Improved placement of movable connectors
Symmetric layout
Improved Drawing Fitting
Improved placement of movable connectors
System Requirements
No changes
Fixes
None
Issues
None
Release 9.1.0
Date
May 20, 2010
Status
General
Overview
In this release, the layout architecture has been optimized to improve performance. Layout speed has improved by twenty to sixty percent. This release also features revamped documentation.
New
None
Improvements
Installation
Improved installation program
Improved licensing setup
Technology
Accelerated XML reading and writing
Layout
All layout
Increased layout speed by twenty to sixty percent
Circular layout
Improved edge labeling with dense drawings
Enhanced clustering quality
Refined clustering options
Hierarchical layout
Improved edge labeling with polyline and orthogonal routing
Orthogonal layout
Refined labeling
Enhanced group constraint quality
Symmetric layout
Improved edge labeling with dense drawings
Enhanced handling of fixed point constraints
Routing
Reduced edge crossings
Significantly enhanced routing with connectors
Labeling
Increased quality
Documentation
Revamped documentation
System Requirements
Added support for JDK 6.0
Added support for these operating systems:
Apple Mac OS X 10.6
Microsoft Windows 7
Sun Solaris 10
Fixes
None
Issues
None
Release 9.0.0
Date
December 15, 2008
Status
General
Overview
This release includes drawing fitting options that enable the drawing to more efficiently use the target drawing area. New node grouping constraints keep specified drawing elements together during a layout operation. Further, this release contains many additional layout, labeling, and routing refinements.
New
Layout
Drawing Fitting optimizes use of the target drawing area
Open and closed group constraints
Documentation
Additional tutorials
Reference page of available resources
Improvements
Layout
Improved support for multi-threaded applications
Reduced number of edge crossings for inter-drawing edges when laying out nested drawings
Refined options for minimum and maximum number of clusters for disconnected drawings with more than one component in the circular layout style