Tom Sawyer Layout, Java Edition

Release 10.0.0

DateMay 11, 2016
StatusGeneral

Overview

This release introduces an option to rotate edge labels so that they run parallel to their associated edge segments. Layout is significantly faster, particularly with large data sets.

Further, this release improves product quality and performance, and updates the supported operating systems.

New

Technology

  • Added JDK 8.0 support

Layout

  • Added edge bend removal for better orthogonal drawings
  • Added ability to rotate edge labels
  • Introduced a new approach that reduces crossings in the orthogonal drawing style

Documentation

  • Added an option to improve documentation search speed by ignoring the API documentation

Improvements

Layout

  • Improved the performance of layout, labeling, and routing
  • Improved inside node connector and labeling placement in all layout styles
  • Improved node labeling to avoid possible overlaps
  • Improved node inside label positioning
  • Improved connector label placement
  • Improved movable connector positioning
  • Improved node packing to eliminate node overlaps after incremental layout
  • Improved disconnected node packing in the circular layout style
  • Improved hierarchical layout performance for nested drawings by as much as eighty-five percent
  • Improved nested hierarchical layout to have fewer crossings
  • Improved disconnected node placement in hierarchical layout
  • Improved node placement in hierarchical layout for nested drawings
  • Improved node packing in nested drawings with a hierarchical layout style
  • Improved orthogonal routing
  • Improved bend removal for orthogonal drawings
  • Improved incremental orthogonal layout positioning
  • Improved edge-length control with labels in symmetric and orthogonal layout

Licensing

  • Licensing setup web proxy information can be set through System properties

Documentation

  • Various improvements in all areas of the documentation, including additions to Javadoc

System Requirements

  • These operating systems have been added:
    • Apple OS X 10.10
    • Apple OS X 10.11
    • Microsoft Windows 10
    • Oracle Linux 6.6
    • Oracle Linux 7.0
    • Red Hat Enterprise Linux 7.0
    • Red Hat Enterprise Linux 6.6
  • These operating systems have been dropped:
    • Apple OS X 10.9
    • Apple OS X 10.8
    • Microsoft Windows 8
    • Oracle Linux 6.0
    • Oracle Linux 5.0
    • Red Hat Enterprise Linux 6.0
  • Added support for Java 8
  • Dropped support for Java 6

Fixes

  • Fixed a performance issue in disconnected node layout
  • Edge routing no longer ignores fixed node position and size
  • Fixed disconnected node placement in hierarchical layout
  • Fixed various issues in nested drawings with fixed connectors
  • Fixed overlaps in node labeling
  • Fixed overlaps between fixed and movable connectors
  • Fixed enlarged margins of a nested drawing
  • Fixed expanded node misplacement in nested hierarchical layout
  • Fixed possible exceptions in orthogonal layout
  • Fixed performance problems in orthogonal layout
  • Fixed movable connector placement in orthogonal layout
  • Fixed non-orthogonal edges in orthogonal drawings

Issues

  • None

Release 9.5.0

DateJanuary 9, 2014
StatusGeneral

Overview

This release improves product quality and layout performance.

New

Layout

  • Orthogonal drawing bend elimination
  • Hierarchical drawing polyline routing bend-squaring option
  • Slope end routing option in orthogonal drawings

Improvements

Layout

  • All layout
    • Five percent faster performance than prior version
    • Improved drawing fitting with nested drawings
    • Improved edge distribution at node sides
    • Enhanced packing of connected components and disconnected nodes
    • Exposed fixed drawing option
    • Exposed embedded node option
    • Exposed embedded edge option
  • Hierarchical
    • Improved orthogonal edge routing to align horizontal and vertical edge segments
  • Orthogonal
    • Refined integrated labeling
    • Improved incremental layout results
  • Symmetric
    • Improved node placement in the presence of moveable connectors
  • Labeling
    • Reduced label overlap in dense drawings
    • Reduced label position ambiguity
  • Routing
    • Improved interdrawing edge routing to connectors
    • Respects arrowhead width

Documentation

  • Dynamic content loading
  • Improved API documentation

System Requirements

  • Added support for these operating systems:
    • Apple OS X 10.8
    • Apple OS X 10.9
    • Oracle Linux 5
    • Oracle Linux 6
    • Microsoft Windows 8
    • Microsoft Windows 8.1
    • Microsoft Windows Server 2012
  • Dropped support for these operating systems:
    • Apple OS X 10.6
    • Apple OS X 10.7
    • Microsoft Windows Vista

Fixes

Drawings

  • Meta-edges may attach to connectors

Layout

  • Orthogonal layout respects connected component and disconnected node spacing options
  • Fixed node label overlaps
  • Fixed interdrawing edge label overlaps

Issues

  • None

Release 9.3.1

DateMarch 14, 2013
StatusGeneral

Overview

This release updates the supported operating systems to allow easier installation on Microsoft Windows 8.

New

  • None

Improvements

  • None

System Requirements

  • Added support for Microsoft Windows 8
  • Added support for JDK 7.0 on Apple Mac OS X

Fixes

  • None

Issues

  • None

Release 9.3.0

DateMarch 30, 2012
StatusGeneral

Overview

Tom Sawyer Layout offers markedly improved performance for large drawings with thousands of nodes. This release introduces a new approach to integrated orthogonal routing within nested drawings. Polyline routing in hierachical layout has been improved. Additionally, labeling is more precise.

New

Technology

  • Added JDK 7.0 support

Improvements

Installers

  • Refined installers
  • Improved installation directories

Layout

  • Circular layout
    • Enhanced rotation of disconnected components
    • Multi-edge spacing option
  • Hierarchical layout
    • Faster performance with constraints and nesting
    • Enhanced integrated labeling with orthogonal routing
    • Integrated orthogonal routing across nesting levels
    • Polyline routing refinements
  • Orthogonal layout
    • Twenty percent performance improvement
    • Enhanced integrated labeling
    • Integrated orthogonal routing across nesting levels
    • Directed multi-edge bundling refinements
  • Symmetric layout
    • Thirty-five percent performance improvement
    • Enhanced rotation of disconnected components
    • Multi-edge spacing option
  • Labeling
    • Improved labeling precision
    • Respects edge thickness
    • Respects arrowheads

System Requirements

  • Added support for these operating systems:
    • Apple Mac OS X Lion 10.7
    • Red Hat Enterprise Linux 6
  • Dropped support for Red Hat Enterprise Linux 5
  • Added support for JDK 7.0
  • Dropped support for JDK 5.0

Fixes

  • Multi-edge spacing respected

Issues

  • None

Release 9.2.0

DateApril 13, 2011
StatusGeneral

Overview

This release provides all of the documentation in HTML format, with global search capability. Additionally, this release addresses the needs of several of our large network management customers.

New

Technology

  • Added batch processing APIs for improved drawing creation performance

Layout

  • All layout
    • Enabled treating certain child drawings as fixed during nested drawing layout

Documentation

  • Added search capability across all documentation

Improvements

Visualization

  • Added option to preserve owner node position during nested drawing changes

Layout

  • All layout
    • Enhanced node and edge embedding during incremental layout
    • Enhanced moveable connector placement when multiple edges are attached
  • Circular layout
    • Improved cluster spacing
    • Improved node spacing within clusters
    • Refined drawing fitting
  • Symmetric layout
    • Refined drawing fitting

Documentation

  • Converted all documentation to HTML format

System Requirements

  • Dropped support for Apple Mac OS X 10.5

Fixes

  • Drawing manager meta-edge APIs return consistent results when meta-edges are not viewable
  • Drawing fitting is respected when arranging connected components in the orthogonal layout style
  • Layout calculates optimal expanded node size when fixed connector labels are present

Issues

  • None

Release 9.1.1

DateOctober 8, 2010
StatusGeneral

Overview

This release includes layout refinements and improved access to hosted licensing.

New

  • None

Improvements

Licensing

  • Simplified access to hosted licensing through a web proxy

Layout

  • Circular layout
    • Improved Drawing Fitting
    • Improved placement of movable connectors
  • Symmetric layout
    • Improved Drawing Fitting
    • Improved placement of movable connectors

System Requirements

  • No changes

Fixes

  • None

Issues

  • None

Release 9.1.0

DateMay 20, 2010
StatusGeneral

Overview

In this release, the layout architecture has been optimized to improve performance. Layout speed has improved by twenty to sixty percent. This release also features revamped documentation.

New

  • None

Improvements

Installation

  • Improved installation program
  • Improved licensing setup

Technology

  • Accelerated XML reading and writing

Layout

  • All layout
    • Increased layout speed by twenty to sixty percent
  • Circular layout
    • Improved edge labeling with dense drawings
    • Enhanced clustering quality
    • Refined clustering options
  • Hierarchical layout
    • Improved edge labeling with polyline and orthogonal routing
  • Orthogonal layout
    • Refined labeling
    • Enhanced group constraint quality
  • Symmetric layout
    • Improved edge labeling with dense drawings
    • Enhanced handling of fixed point constraints
  • Routing
    • Reduced edge crossings
    • Significantly enhanced routing with connectors
  • Labeling
    • Increased quality

Documentation

  • Revamped documentation

System Requirements

  • Added support for JDK 6.0
  • Added support for these operating systems:
    • Apple Mac OS X 10.6
    • Microsoft Windows 7
    • Sun Solaris 10

Fixes

  • None

Issues

  • None

Release 9.0.0

DateDecember 15, 2008
StatusGeneral

Overview

This release includes drawing fitting options that enable the drawing to more efficiently use the target drawing area. New node grouping constraints keep specified drawing elements together during a layout operation. Further, this release contains many additional layout, labeling, and routing refinements.

New

Layout

  • Drawing Fitting optimizes use of the target drawing area
  • Open and closed group constraints

Documentation

  • Additional tutorials
  • Reference page of available resources

Improvements

Layout

  • Improved support for multi-threaded applications
  • Reduced number of edge crossings for inter-drawing edges when laying out nested drawings
  • Refined options for minimum and maximum number of clusters for disconnected drawings with more than one component in the circular layout style
  • Enhanced incremental hierarchical layout style results
  • Reduced number of edge crossings in the hierarchical layout style
  • Reduced local edge crossings in the orthogonal layout style
  • Improved node placement when fixed connectors are present in both symmetric and orthogonal layout styles
  • Enhanced multiedge routing in both symmetric and circular layout styles
  • Increased labeling quality

Documentation

  • Enhanced Developer's Guide

System Requirements

  • Dropped support for JDK 1.4
  • These operating systems have been added:
    • Apple Mac OS X 10.5
    • IBM AIX 5.3
    • Red Hat Enterprise Linux 5*
    • Ubuntu Linux 8.0*
  • These operating systems have been dropped:
    • Apple Mac OS X 10.3
    • HP-UX 11
    • IBM AIX 4
    • Microsoft Windows 2000
    • Microsoft Windows Server 2003
    • Sun Solaris 9

* The 32-bit compatibility layer is required for 64-bit Linux systems.

Issues

  • None

Release 8.0.0

DateMay 1, 2007
StatusGeneral

Overview

This release significantly improves overall product performance and introduces a new software licensing system.

New

System

  • Software licensing server and administration client

Improvements

Layout

  • Reduced edge crossings in the circular layout style
  • Enhanced polyline routing in the hierarchical layout style
  • Improved orthogonal routing performance in the hierarchical layout style
  • Refined edge routing with connectors in the orthogonal layout style
  • Improved performance in the orthogonal layout style
  • Improved performance with large graphs in the symmetric layout style
  • Reorganized constraints
  • Enabled constraint sharing among different layout styles
  • Improved routing performance

System Requirements

  • Added support for JDK 1.6
  • Dropped support for JDK 1.3
  • These operating systems have been added:
    • Apple Mac OS X 10.4
    • Microsoft Windows Vista
    • Red Hat Enterprise Linux 4
  • These operating systems have been dropped:
    • Compaq Tru64
    • Silicon Graphics IRIX
    • Sun Solaris 7 and 8

Fixes

  • None

Issues

  • None

Release 7.0.0

DateJune 28, 2005
StatusGeneral

Overview

This release features enhanced circular and symmetric layout styles and several other layout style improvements.

New

Layout

  • Option for placing labels over edges

Improvements

Layout

  • Circular layout
    • Enhanced clustering
    • Enhanced incremental layout
    • Added flexible spacing control
  • Hierarchical layout
    • Enhanced connector layout
    • Integrated labeling during layout with orthogonal routing
  • Orthogonal layout
    • Enhanced constraint-based layout
    • Integrated labeling during orthogonal layout
    • Improved drawing resolution
    • Enhanced incremental layout
  • Improved connector labeling

System Requirements

  • Added support for JDK 1.5
  • Added support for Apple Mac OS X

Fixes

  • None

Issues

  • None