Tom Sawyer Visualization, Java Edition

 Show Releases

Release 11.0.0

Date	June 10, 2020
Status	General

Overview

Tom Sawyer Visualization, Java Edition, Release 11.0.0 adds many innovations since Release 10.0.0.

Orthogonal layout has been enhanced with an improved node growth model to handle inside connector labels, and connector constraints to control the order and positioning of connectors. This release also includes the ability to rotate connector labels and to visualize edge crossings with configurable jumpovers. For hierarchical layout with orthogonal edge routing and orthogonal layout, connector support has been improved to include fixed-size connectors with slope-end routing, variable-sized connectors that automatically grow based on the number of edges that are attached to them, and connectors can be nested within other connectors. These additional forms of connector support allow for more customized drawings with complex structures. In addition for these two styles, layout of connectors takes into account the labels of incident edges and connector labels and allows the connectors to grow accordingly.

Release 11.0.0 also brings significant performance improvements across all the layout styles.

New

Drawings

• Hierarchical with Orthogonal Edge Routing and Orthogonal
• Added support for nested connectors
• Added connector constraints
• Added the ability to rotate connector labels
• Added nested connector labeling
• Added support for outside node and inside node connector labeling
• All Layout Styles
• Added support for visualizing edge crossings with configurable jumpovers

Improvements

Drawings

• Circular
• Reduced number of edge crossings
• Hierarchical
• Refined layout behavior for undirected edges
• Improved centering of attachment points for edges in hierarchical drawings with orthogonal edge routing
• Improved movable connector positioning in hierarchical polyline layout
• Improved edge labeling for trees
• Hierarchical with Orthogonal Edge Routing and Orthogonal
• Improved the node growth model to support inside connector labels, node labels, and images
• Orthogonal
• Greatly reduced edge crossings
• Improved support for achieving a specified aspect ratio
• Improved incremental orthogonal layout with leaf nodes
• Improved placement of connectors in nested drawings
• Improved centering of attachment points for edges
• Improved edge routing to avoid unnecessary crossings for nested drawings
• Improved edge placement for degree 4 diamond-shaped decision nodes
• Enabled slope-end routing for edges attached to connectors
• Enabled connectors to grow automatically if more than one edge attaches to them
• Enabled connector positioning on a specific node side, outside of the node, on the node border, or inside the node
• Improved movable connector ordering
• Improved orthogonal layout to reduce occasional label overlap
• Reduced the number of bends
• Improved drawing compaction
• All Layout Styles
• Significantly improved layout performance
• Improved disconnected node tiling and packing
• Improved edge and node labeling
• Changed default layout options; refer to the Upgrading guide to see how these options affect your current and new applications
• Added support for constant curvature in curved edges
• Documentation
• Improved the loading speed of the documentation

System Requirements

• These operating systems have been added:
• Apple macOS 10.15
• Microsoft Windows Server 2016
• Oracle Linux 7.6
• Red Hat Enterprise Linux 7.6
• SUSE Linux Enterprise Server 12.2
• These Java libraries have been added:
• Oracle Java 11
• Oracle Java 12
• OpenJDK 11
• OpenJDK 12
• OpenJDK 13
• These operating systems have been dropped:
• Apple OS X 10.10
• Apple OS X 10.11
• Microsoft Windows 7
• Microsoft Windows 8.1
• Microsoft Windows Server 2008
• Oracle Linux 6.6
• Oracle Linux 7.0
• Oracle Solaris 10
• Oracle Solaris 11
• Red Hat Enterprise Linux 6.6
• Red Hat Enterprise Linux 7.0
• SUSE Linux Enterprise Server 11 SP3
• Dropped support for Oracle Java 7

Fixes

Drawings

• Orthogonal
• Improved nested diagram edge ordering incident to nodes
• Improved orthogonal layout to avoid the rare cases where edges intersected with nodes
• All Layout Styles
• Fixed the hit-testing of rotated labels, so the tooltips display correctly
• Fixed a potential exception that could occur while expanding a node with an empty child drawing
• Fixed an issue where connectors and labels were moved after unrelated changes
• Fixed rendering of arrowheads

Issues

• Due to security setting updates in Apple macOS 10.15, installation of Tom Sawyer Visualization on macOS may not be able to proceed normally. To install Tom Sawyer Visualization, right-click the installer and click Show in Finder when the "can't be opened" dialog displays. Right-click the installer again and click Open when the "can't be opened" dialog redisplays.
• When installing Tom Sawyer Visualization on Windows 10, you may receive the following warning: "Windows protected your PC: Windows Defender SmartScreen prevented an unrecognized app from starting. Running this app might put your PC at risk." We confirm that our installer is signed with a valid Tom Sawyer Software digital certificate, therefore you may safely click the "Run anyway" button to install the software.
• Tom Sawyer Licensing does not always run automatically after installation of Tom Sawyer Visualization on macOS and must be run manually after installation. From the Tom Sawyer Visualization installation directory, open bin/Tom Sawyer Licensing Setup.
• Use of OpenJDK 11 or 12 can cause issues with multiline, vertical, and diagonal edge labels. This issue does not occur when Tom Sawyer Visualization is used with OpenJDK 13.
• The documentation must be opened in Google Chrome.

Release 10.0.0

Date	May 11, 2016
Status	General

Overview

Tom Sawyer Visualization now supports Apple Retina display devices. This release introduces an option to rotate edge labels so that they run parallel to their associated edge segments. Additionally, we provide users with smoother transitions after global layout, incremental layout, or complexity management operations. Layout and rendering are significantly faster, particularly with large data sets.

Further, this release improves product quality and performance, and updates the supported operating systems.

New

Technology

• Added JDK 8.0 support

Drawings

• Added support for Apple Retina display devices
• Introduced smooth viewport transitioning from an initial configuration to a final configuration during complex operations

Layout

• Added edge bend removal for better orthogonal drawings
• Added ability to rotate edge labels
• Introduced a new approach that reduces crossings in the orthogonal drawing style

Examples

• Added a new example demonstrating rotated labels using World Cups data

Demonstration Application

• Added menu options to select labels of different types

Documentation

• Added an option to improve documentation search speed by ignoring the API documentation

Improvements

Drawings

• Improved character positioning in text strings
• Improved text rendering performance
• Improved precise shape clipping calculation
• Improved interaction with expanded nodes
• Improved precise clipping to node image outlines
• Improved rendering of the overview
• Improved animation
• Improved rendering speed

Layout

• Improved the performance of layout, labeling, and routing
• Improved inside node connector and labeling placement in all layout styles
• Improved node labeling to avoid possible overlaps
• Improved node inside label positioning
• Improved connector label placement
• Improved movable connector positioning
• Improved node packing to eliminate node overlaps after incremental layout
• Improved disconnected node packing in the circular layout style
• Improved hierarchical layout performance for nested drawings by as much as eighty-five percent
• Improved nested hierarchical layout to have fewer crossings
• Improved disconnected node placement in hierarchical layout
• Improved node placement in hierarchical layout for nested drawings
• Improved node packing in nested drawings with a hierarchical layout style
• Improved orthogonal routing
• Improved bend removal for orthogonal drawings
• Improved incremental orthogonal layout positioning
• Improved edge-length control with labels in symmetric and orthogonal layout

Licensing

• Licensing setup web proxy information can be set through System properties

Demonstration

• Improved memory release process after closing drawings

Documentation

• Various improvements in all areas of the documentation, including additions to Javadoc

System Requirements

• These operating systems have been added:
• Apple OS X 10.10
• Apple OS X 10.11
• Microsoft Windows 10
• Oracle Linux 6.6
• Oracle Linux 7.0
• Red Hat Enterprise Linux 7.0
• Red Hat Enterprise Linux 6.6
• These operating systems have been dropped:
• Apple OS X 10.9
• Apple OS X 10.8
• Microsoft Windows 8
• Oracle Linux 6.0
• Oracle Linux 5.0
• Red Hat Enterprise Linux 6.0
• These browsers have been added:
• Apple Safari 9.1
• Apple Safari 8.0
• Microsoft Edge
• Opera
• These browsers have been dropped:
• Apple Safari 7.0
• Apple Safari 6.0
• Microsoft Internet Explorer 7
• Added support for Java 8
• Dropped support for Java 6
• Added support for applets in the Opera browser

Fixes

Drawings

• Nested node size no longer changes on node selection
• The Overview updates properly when the main drawing canvas is updated
• Fixed a potential exception in curved edge hit-testing
• Mouse wheel + Shift key events work correctly on Linux

Layout

• Fixed a performance issue in disconnected node layout
• Edge routing no longer ignores fixed node position and size
• Fixed disconnected node placement in hierarchical layout
• Fixed various issues in nested drawings with fixed connectors
• Fixed overlaps between fixed and movable connectors
• Fixed enlarged margins of a nested drawing
• Fixed overlaps in node labeling
• Fixed expanded node misplacement in nested hierarchical layout
• Fixed possible exceptions in orthogonal layout
• Fixed performance problems in orthogonal layout
• Fixed movable connector placement in orthogonal layout
• Fixed non-orthogonal edges in orthogonal drawings

Issues

• None

Release 9.5.1

Date	March 20, 2014
Status	General

Overview

This release introduces a new Web Proxy Configuration application to help with license management for direct enterprise deployments. This release also addresses issues with applets and includes updated documentation on how to better deploy applets.

New

Build and Distribution

• Web Proxy Configuration application to enable access to the license server from different environments

Improvements

Demonstration

• Improved the Tom Sawyer Visualization demonstration applet

Documentation

• Added information about deploying and running applets

System Requirements

• None

Fixes

• Applets running in the Java security sandbox are now supported
• Corrected the node and edge drop-down toolbar behavior in applets
• Resolved a minor layout issue that occurred when calling orthogonal layout from deep within a nesting hierarchy

Issues

• None

Release 9.5.0

Date	January 9, 2014
Status	General

Overview

This release improves product quality, features, and performance.

New

Technology

• Apple OS X full screen support

Drawings

• Support for undirected meta-edge compression

Layout

• Orthogonal drawing bend elimination
• Hierarchical drawing polyline routing bend-squaring option
• Slope end routing option in orthogonal drawings

Examples

• Large SWT example application

Improvements

Drawings

• Precise shape clipping enhancements
• Refined hover behavior
• Enhanced text rendering
• Improved rendering performance
  • For small objects at low resolutions
  • With level-of-detail transitions
• Improved animation effects
• Zoom + and Zoom - tools support zoom animation preferences
• Refined node in-place text editing

Layout

• All layout
  • Five percent faster performance than prior version
  • Improved drawing fitting with nested drawings
  • Improved edge distribution at node sides
  • Enhanced packing of connected components and disconnected nodes
  • Exposed fixed drawing option
  • Exposed embedded node option
  • Exposed embedded edge option
• Hierarchical
  • Improved orthogonal edge routing to align horizontal and vertical edge segments
• Orthogonal
  • Refined integrated labeling
  • Improved incremental layout results
• Symmetric
  • Improved node placement in the presence of moveable connectors
• Labeling
  • Reduced label overlap in dense drawings
  • Reduced label position ambiguity
• Routing
  • Improved interdrawing edge routing to connectors
  • Respects arrowhead width

Documentation

• Dynamic content loading
• Improved API documentation

System Requirements

• Added support for these operating systems:
  • Apple OS X 10.8
  • Apple OS X 10.9
  • Oracle Linux 5
  • Oracle Linux 6
  • Microsoft Windows 8
  • Microsoft Windows 8.1
  • Microsoft Windows Server 2012
• Dropped support for these operating systems:
  • Apple OS X 10.6
  • Apple OS X 10.7
  • Microsoft Windows Vista

Fixes

Drawings

• Meta-edges may attach to connectors

Layout

• Orthogonal layout respects connected component and disconnected node spacing options
• Fixed node label overlaps
• Fixed interdrawing edge label overlaps

Issues

• None

Release 9.3.1

Date	March 14, 2013
Status	General

Overview

This release updates the supported operating systems to allow easier installation on Microsoft Windows 8.New

• None

Improvements

• None

System Requirements

• Added support for Microsoft Windows 8
• Added support for JDK 7.0 on Apple Mac OS X

Fixes

• None

Issues

• None

Release 9.3.0

Date	March 30, 2012
Status	General

Overview

Tom Sawyer Visualization introduces new hover, select, and highlight metaphors. New precise shape clipping improves drawing resolution.

This release offers markedly improved layout performance for large drawings with thousands of nodes. Additionally, labeling is much more precise.

New

Technology

• Added Apple Mac OS X Lion Launchpad support
• Added JDK 7.0 support

Drawings

• Added precise shape clipping
• Added rounded rectangle UI element

Graphics

• New hover, select, and highlighting graphics

Improvements

Installers

• Refined installers

Drawings

• Faster performance for large, heavily nested drawings

Graphics

• Easier to define level of detail in scene-based graphics
• Improved tooltip rendering

Layout

• Circular layout
  • Enhanced rotation of disconnected components
  • Multi-edge spacing option
• Hierarchical layout
  • Faster performance with constraints and nesting
  • Enhanced integrated labeling with orthogonal routing
  • Integrated orthogonal routing across nesting levels
  • Polyline routing refinements
• Orthogonal layout
  • Twenty percent performance improvement
  • Enhanced integrated labeling
  • Integrated orthogonal routing across nesting levels
  • Directed multi-edge bundling refinements
• Symmetric layout
  • Thirty-five percent performance improvement
  • Enhanced rotation of disconnected components
  • Multi-edge spacing option
• Labeling
• Improved labeling precision
• Respects edge thickness
• Respects arrowheads

System Requirements

• Added support for these operating systems:
  • Apple Mac OS X Lion 10.7
  • Red Hat Enterprise Linux 6
• Dropped support for Red Hat Enterprise Linux 5

• Added support for JDK 7.0
• Dropped support for JDK 5.0

Fixes

• Unselected edge labels remain fixed during edge routing
• Multi-edge spacing respected
• Labels with simple UIs are updated correctly after batch processing

Issues

• None

Release 9.2.0

Date	April 13, 2011
Status	General

Overview

This release provides all of the documentation in HTML format, with global search capability. Additionally, this release addresses the needs of several of our large network management customers.

New

Technology

• Added batch processing APIs for improved drawing creation performance

Layout

• All layout
  • Enabled treating certain child drawings as fixed during nested drawing layout

Documentation

• Added search capability across all documentation

Improvements

Visualization

• Added new Switch UI element
• Added option to preserve owner node position during nested drawing changes

Layout

• All layout
  • Enhanced node and edge embedding during incremental layout
  • Enhanced moveable connector placement when multiple edges are attached
• Circular layout
  • Improved cluster spacing
  • Improved node spacing within clusters
  • Refined drawing fitting
• Symmetric layout
  • Refined drawing fitting

Documentation

• Improved API documentation
• Converted all documentation to HTML format

Demonstration

• Enabled Apple Mac OS X global menu support

System Requirements

• Dropped support for Apple Mac OS X 10.5

Fixes

• Drawing manager meta-edge APIs return consistent results when meta-edges are not viewable
• Drawing fitting is respected when arranging connected components in the orthogonal layout style
• Layout calculates optimal expanded node size when fixed connector labels are present
• Drawing canvas displays correctly in Apple Mac OS X
• Nesting border displays correctly at all zoom levels
• Top-justified text displays correctly at all zoom levels
• Rotation UI element behaves correctly when drawing object bounds are not set
• Layout properties margin spacing aligns correctly in Apple Mac OS X
• The demonstration application running as an Applet displays the Overview correctly
• Option enables exporting non-standard Type 1 fonts into PDF

Issues

• Every Java applet currently has serious issues with Google Chrome 10 and Firefox 4. These issues are expected to be addressed in a Java update.

Release 9.1.1

Date	October 8, 2010
Status	General

Overview

This release provides a number of improvements including enhanced layout animation of nested drawings, improved rendering precision, and refined automated drawing fitting.

New

• Added annotated image UI element class

Improvements

Licensing

• Simplified access to hosted licensing through a web proxy

Technology

• Enhanced support for Apple keyboards

Visualization

• Drawing Representation
  • Meta-edge compression can now disregard interdrawing edge direction
• User Interactions
  • Accelerated dragging speed for collapsed nodes

Layout

• All layout
  • Enhanced layout animation for nested graphs
• Circular layout
  • Improved Drawing Fitting
  • Improved placement of movable connectors
• Symmetric layout
  • Improved Drawing Fitting
  • Improved placement of movable connectors

System Requirements

• No changes

Fixes

• Properties Inspector behaves correctly when set to read-only
• UI elements display correctly at all zoom levels in Print Preview and as exported images
• Enhanced redraw accuracy

Issues

• None

Release 9.1.0

Date	May 20, 2010
Status	General

Overview

In this release, the visualization and layout architectures have been optimized to improve performance. Layout speed has improved by twenty to sixty percent.

This release also introduces improved support for multi-threaded applications, an Overview window that responds dynamically, accelerated selection, and revamped documentation.

New

• Refined layout animation
• Dynamic Overview response
• New Eclipse SWT tutorial

Improvements

Installation

• Improved installation program
• Improved licensing setup

Technology

• Enhanced support for multi-threaded applications
• Improved support for the Apple Mac OS X user interface
• Improved support for Eclipse SWT applications
• Accelerated XML reading and writing

Visualization

• Drawing Representation
  • Text UI elements now support a maximum width
  • Data driven graphic examples show structural zooming
• User Interactions
  • Accelerated selection
  • Improved layout command usability

Layout

• All layout
  • Increased layout speed by twenty to sixty percent
• Circular layout
  • Improved edge labeling with dense drawings
  • Enhanced clustering quality
  • Refined clustering options
• Hierarchical layout
  • Improved edge labeling with polyline and orthogonal routing
• Orthogonal layout
  • Refined labeling
  • Enhanced group constraint quality
• Symmetric layout
  • Improved edge labeling with dense drawings
  • Enhanced handling of fixed point constraints
• Routing
  • Reduced edge crossings
  • Significantly enhanced routing with connectors
• Labeling
  • Increased quality

Documentation

• Revamped documentation

System Requirements

• Added support for JDK 6.0
• Added support for these operating systems:
  • Apple Mac OS X 10.6
  • Microsoft Windows 7
  • Sun Solaris 10

Fixes

• Tutorials run more smoothly
• All layout options can be applied deeply
• Dialog boxes disable automatically during threaded layout
• Compressed SVG files now load by URL

Issues

• None

Release 9.0.0

Date	December 15, 2008
Status	General

Overview

This release introduces a new data-driven, scene-based graphics system with integrated expression language support. The new graphics system simplifies the creation of drawings with advanced graphics and behavior.

This release also introduces several improvements to the graphical user interface components. It introduces a layout progress indicator and provides a layout cancel facility. It introduces fade transitions, animation, and multi-threaded execution for the layout, routing, and labeling operations. Formatting options fit the drawing to the drawing canvas or the printed page. Further, this release contains many additional layout, labeling, and routing refinements.

New

Drawing Representation

• Data-driven, scene-based, drawing element user interface (UI) framework:
  • Drawing element scene hierarchies provide rich UI decoration
  • Runtime drawing element construction and manipulation
  • Expression language enables dynamic control of UI representation
  • XML representation of drawing element UIs
• Predefined drawing element UIs:
  • Industry standard shapes for Networking and UML diagrams
  • Expanded node UI displays a small summary of the collapsed node UI
  • Varying level of detail based on zoom level
  • Graphical badges enable drill-down, expand, and collapse actions

Display Components

• Interpolation and fade transition animation
• XML-driven drawing element palette
• XML-driven preferences dialog box

Layout

• Non-blocking layout threads
• Layout progress and cancel
• Drawing Fitting optimizes use of the drawing canvas or printed page
• Open and closed group constraints

Documentation

• Additional tutorials
• Reference page of available resources

Improvements

Layout

• Reduced number of edge crossings for inter-drawing edges when laying out nested drawings
• Refined options for minimum and maximum number of clusters for disconnected drawings with more than one component in the circular layout style
• Enhanced incremental hierarchical layout style results
• Reduced number of edge crossings in the hierarchical layout style
• Reduced local edge crossings in the orthogonal layout style
• Improved node placement when fixed connectors are present in both symmetric and orthogonal layout styles
• Enhanced multiedge routing in both symmetric and circular layout styles
• Increased labeling quality

Demonstration Application

• Reorganized toolbars and menus
• Redesigned graphical UI and icons

Documentation

• Enhanced Developer's Guide

System Requirements

• Dropped support for JDK 1.4
• These operating systems have been added:
  • Apple Mac OS X 10.5
  • IBM AIX 5.3
  • Red Hat Enterprise Linux 5*
  • Ubuntu Linux 8.0*
• These operating systems have been dropped:
  • Apple Mac OS X 10.3
  • HP-UX 11
  • IBM AIX 4
  • Microsoft Windows 2000
  • Microsoft Windows Server 2003
  • Sun Solaris 9

*The 32-bit compatibility layer is required for 64-bit Linux systems.

Issues

• Layout
  • The layout command option to invoke the layout operation in the current thread is missing. A workaround is available.

Release 8.0.2

Date	June 5, 2009
Status	General

Overview

This release addresses a license verification issue for users with limited access privileges.

New

• None

Improvements

• None

System Requirements

• No changes

Fixes

• This release enables Tom Sawyer license verification in Microsoft Windows XP and Microsoft Windows Vista when users have restricted access to their system.

Issues

• None

Release 8.0.1

Date	May 10, 2009
Status	General

Overview

This release improves support for internationalization.

New

• None

Improvements

• Improved internationalization support for Tom Sawyer Visualization dialog boxes.

System Requirements

• No changes

Fixes

• Removed an unnecessary warning message in applets that use the Tom Sawyer Visualization deployment libraries.

Issues

• None

Release 8.0.0

Date	May 1, 2007
Status	General

Overview

This release introduces several user interaction refinements and layout improvements, in particular when working with large drawings. Hit-testing sensitivity at low zoom levels is improved, enabling users to select and locate specific nodes and edges more easily. Connectors can now be dragged to new locations, and export to GIF format is supported.

Further, this release introduces a new symmetric layout algorithm and improvements to each layout style. New tutorials demonstrate how to create a visualization application and add interactive features.

New

System

• Software licensing server and administration client

Drawing Representation

• Node shape selection from the Object Properties Inspector
• Dragable connectors

Printing and Exporting

• GIF export

Layout

• Symmetric layout style algorithm dramatically enhances performance with large drawings

Documentation

• Comprehensive tutorials for developers

Improvements

System

• Enhanced support for Apple Macintosh computers

User Interactions

• Enhanced hit-testing sensitivity for improved selection at low zoom levels
• Several link navigation speeds

Layout

• Reduced edge crossings in the circular layout style
• Enhanced polyline routing in the hierarchical layout style
• Improved orthogonal routing performance in the hierarchical layout style
• Refined edge routing with connectors in the orthogonal layout style
• Improved performance in the orthogonal layout style
• Improved performance with large graphs in the symmetric layout style
• Reorganized constraints
• Enabled constraint sharing among different layout styles
• Improved routing performance

Documentation

• Enhanced Developer's Guide

System Requirements

• Added support for JDK 1.6
• Dropped support for JDK 1.3
• These operating systems have been added:
• Microsoft Windows Vista
• Red Hat Enterprise Linux 4
• These operating systems have been dropped:
• Silicon Graphics IRIX
• Sun Solaris 7 and 8

Fixes

• None

Issues

• None

Release 7.0.0

Date	May 13, 2005
Status	General

Overview

This release introduces the circular layout style in pure Java. It also includes various improvements in layout algorithms, offering significant enhancements in layout quality and layout speed.

New

Rendering

• SVG image as drawing background
• Text anti-aliasing

User Interactions

• Enabled node drag and drop across nested drawings
• Pluggable interactive tool sets
• Secondary visual components can be shared by several canvases

Layout

• Option for placing labels over edges

Improvements

Display Components

• Improved memory usage for UI images
• Added options for customizing graphical badges

Layout

• Integrated nested layout
• Circular layout
  • Accelerated performance
  • Enhanced clustering and node placement
  • Enabled group constraints
  • Automated labeling
  • Enhanced incremental layout
  • Added flexible spacing control
• Hierarchical layout
  • Integrated labeling during layout with orthogonal routing
• Orthogonal layout
  • Increased speed in draft mode
  • Enhanced constraint-based layout
  • Integrated labeling during orthogonal layout
• Symmetric layout
  • Dramatically accelerated performance

Documentation

• Expanded content and source code examples

System Requirements

• Added support for JDK 1.5
• Added support for integration with Eclipse SWT 3.0 or later
• Dropped support for Compaq Tru64

Fixes

• None

Issues

• None